Inventors: Enid Scheil, Karl von Reden
Publication No. US 7586098 B2
Overview: This technology is used to strip electrons from fast moving negative ions in particle accelerator beam lines. In particular, accelerator mass spectrometry uses tandem accelerators, in which negative ions are converted to positive ions in the stripping device. Industrial and research applications of tandem accelerators with this kind of technology include ion implantation and particle induced x-ray emission (PIXE).
Technology: The stripping device consists of a self-supporting aggregate or mat of carbon nanotubes. When it is bombarded with a negative ion beam it strips electrons from the ions. This ion stripper device represents an improvement in durability over methods using graphite foils and avoids pressure related problems with gas stripping devices.